Andreas Gursky was born in 1955 in Leipzig and raised in Dusseldorf, Germany. His study of photography started early, as he was the son of a commercial photographer. Gursky was formally educated at the Kustakademie Dusseldorf. His photographic style is characteristically large in scale, features a landscape or architecture, and uses an oblique perspective. He was heavily influenced by Hilla and Bernd Becher’s objective, systematic photographs of industrial subjects. From the 1990s, he began to manipulate his photographs with the aid of computers. In 2001, the Museum of Modern Art in New York organised a retrospective of his work.
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